Category : Semiconductor equipment > Compound semiconductors

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The AIX 200 family of reactors can incorporate substrates from 2" to 4", depending on the type of reactor (see Overview). Various models exist for different applications. Standard deposition temperatures of up to around 1300°C can be achieved. Special solutions for innovative compound materials, higher deposition temperatures, etc. are also possible.

They are made of quartz or stainless steel. All research reactors are equipped with removable and replaceable quartz liner pipes and susceptors, enabling extremely rapid switches between material systems and cleaning of all gas-conducting reactor components.

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- Enhancing your R&D and pilot-production needs
- Enabling technology for OLED production
- Multi-wafer MOCVD reactors
- Planetary reactor mass production system

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- Compound semiconductor solar cells and solar panels
- Multi-wafer MOCVD reactors
- Planetary reactor mass production system

List of all articles in this sub-category Compound semiconductors

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