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Category : Semiconductor equipment > Semiconductor manufacturing equipment
Dry Etcher System
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The systems can be categorized in two different types, Wafer Dry Etcher and Photo-mask Dry Etcher. Our dry etcher system is Anisotropic etching of photo-mask. Applicable processes are Descum, Anisotropic Cr Etch on Quartz, Anisotropic MoSi, and Anisotropic Quartz Etch. The etching process is used in many different industries. Our etcher is used in photo-mask production line of semiconductor for mask pattern.
Article from Tecport Optics, Inc.
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