Category : Semiconductor equipment > Wafer test/inspection and measurement systems

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The CAMECA IMS Wf and SC Ultra are designed to meet the increasing needs for dynamic SIMS measurements in semiconductors.
A first requisite is the optimization of SIMS analytical conditions for ultra-shallow depth profiling. This requires sputtering at Ultra-Low Energy with well-controlled conditions (species, angle, gas flooding).
As SIMS technique matures, users want to reduce the expertise required to achieve high reproducibility and high precision measurements. The trend is clearly toward unattended, automated analysis.
The capability of full wafer analysis and mapping is a growing demand due in part to the increased cost of the 200mm or 300mm wafers. In addition, due to the increasing complexity of manufacturing processes, measurements from small test areas of patterned wafers are now prefered to blank wafer analysis, in order to be really representative of the product. This increases the need for high transmission instruments (magnetic sector SIMS capable of high sensitivity from small sputtered craters).
Finally, a ULE-SIMS should also be capable of high sample throughput and fast deep depth profiling.

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List of all articles in this sub-category Wafer test/inspection and measurement systems

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