Category : Semiconductor equipment > Compound semiconductors

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AIXTRON's mass production systems are based on the planetary concept (Planetary Reactor), which was developed by Philips and is under exclusive license to AIXTRON. They are able to incorporate substrates from 2" to 10" in size (see Overview), and consist of quartz and easily replaceable graphite components, with a water-cooled stainless steel housing. All AIXTRON systems are fitted with horizontal laminar flow reactors. The laminar flow principle guarantees extremely precise heterojunctions and unequalled control of deposition rates at the monolayer level. The combination of this principle with AIXTRON's unique multiple substrate carrier rotation, known as Gas Foil Rotation (GFR), ensures excellent deposition homogeneity regarding layer width, composition and doping. In addition, the special reactor inlet valve, which allows the separation of certain gases, ensures a uniform outward radial flow and optimum distribution adjustment.

The reactors are heated via infrared (850°C) or inductively (1200°C to 1700°C in the case of silicon carbide) and can be equipped with a wide range of in-situ sensors, including the EpiRAS exclusive to AIXTRON reactors.

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- Enhancing your R&D and pilot-production needs
- Enabling technology for OLED production
- AIX 200 horizontal reactors
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- Compound semiconductor solar cells and solar panels
- AIX 200 horizontal reactors
- Multi-wafer MOCVD reactors

List of all articles in this sub-category Compound semiconductors

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