Reflection High-Energy Electron Diffraction gun

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Features:
30kV RHEED Energy
Independent grid control
X, Y deflection
Air-side magnetic lens and deflection system
Factory aligned
Beam blanking option

The Oxford Scientific 30kV RHEED Electron Source is a fully UHV compatible RHEED gun bakeable to 200°C and includes all the features and options required to take advantage of this powerful analysis technique. Capable of being operated over a wide range of pressures RHEED can be used in a variety of applications such as molecular beam epitaxy, thin film deposition, chemical vapour deposition, sputter deposition (may need differential pumping), and other coating and deposition techniques.

The power supply has been optimised to take advantage of the latest developments in HV electronics, with a modular approach to the design ensuring easy servicing and maintenance should the need arise. Independent control of the grid voltage (Wehnelt) gives complete control of the beam quality and characteristics, with independent adjustment of spot size and beam current which is not possible in self or auto-bias designs.

Factory alignment of the gun ensures that filament replacement is very straightforward with the minimum of alignment required.

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