Category : Spectroscopy, colorimetry, photometry, fluometry > Spectroscopic ellipsometry

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This compact and easy to use bench-top spectroscopic ellipsometer SpecEL-2000 is the tool of choice for thin film measurement on flat samples like wafers or glass plates, if precise measurements of layers thickness or refractive index, absorption or components ratio is needed.
As in reflectometry the basic requirement for successful measurement is at least a semi-transparent film.

Depending on the layer and substrate material it is possible to measure the thickness of thin films in a range of 1nm up to about 5µm.

Compared to reflectometry, spectroscopic ellipsometry has the big advantage of measuring just relative changes in the phase and amplitude of the light instead of absolute intensity. In this way ellipsometry is independent from any reference measurement and multiple parameters can be determined simultaneously.

While using a very powerful analysis software in the background with all different modelling possibilities like Cauchy, OJL,Tauc-Lorentz, Drude, EMA, different kinds of oscillators and many more, the main user interface for standard measurements still allows a very simple one button operation for easy production use.

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- PlasCalc 2000 fiberoptic spectrometer
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- FilmTek 2000SE spectroscopic ellipsometer
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List of all articles in this sub-category Spectroscopic ellipsometry

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