Category : Optics (components, coatings, instruments and systems) > Optical instrumentation, systems and accessories

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Monitor Thin Film Deposition In Real Time With Bomco's UHV Windows
"This is as close as anyone has come to windowless, optical access to an ultrahigh vacuum chamber."*

As the demand for higher performance materials for semiconductors increases, so does the need for real-time information about crystal growth by molecular beam epitaxy (MBE). Optical access to the vacuum environment of this process is essential to determine such data as sample temperature, tolerances of layer thicknesses and composition. Engineers at Bellcore and Bomco worked together to develop a UHV window suitable for this environment. This UHV window permits the use of optical pyrometry, elliposometry, light scattering and reflectance-difference spectoscopy (RDS) to obtain data in real time. . . "this is as close as anyone has come to windowless, optical access to an ultra high vacuum chamber."*

- Advantages over conventional glass viewports:
Unlike conventional viewports, Bomco UHV windows can be heated to 400 degrees Celsius to remove typical MBE growth deposits without venting the station for disassembly and cleaning. By eliminating deposit-induced inaccuracies in optical pyrometry, the Bomco UHV window allows highlight influences to be transmitted with minimum attenuation.
Tests have also shown that retardations of the Bomco UHV windows are consistently and substantially less than those of conventional viewports. In the measurement of strain homogeneity, the Bomco UHV windows were homogeneous to within 0.1 degree, while conventional viewports were inhomogeneous by more than 1 degree. Access to the window periphery allows the window to be loaded mechanically to tune residual strain birefringence to negligible values.

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