Vacuum Ultraviolet ellipsometer

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The J. A. Woollam Company now has a second generation Vacuum Ultraviolet ellipsometer designed to accommodate large samples and photo mask or wafer mapping. The wide spectral range of the VUV-VASE® gives it an incredible versatility to characterize all type of materials: semiconductors, dielectrics, polymers, metals, multilayers, and more. Because the VUV-VASE® ellipsometer is able to measure such short wavelengths, it is sensitive to ultra-thin films and it's able to measure accurate n and k values at lithography exposure lines (157nm, 193nm, and 248nm).

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- FilmTek 2000SE spectroscopic ellipsometer
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- Vase ellipsometer
- Infrared variable angle spectroscopic ellipsometer
- MASE M-2000® ellipsometer
- FPM-2000 ellipsometer designed for the display industry

List of all articles in this sub-category Spectroscopic ellipsometry

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